PLASMA GUARD FOR CHAMBER PROVIDED WITH ELECTROSTATIC CHUCK

摘要

PROBLEM TO BE SOLVED: To prevent charged particles from drifting or diffusing out of a plasma reaction zone above an electrostatic chuck by providing a plasma guard material, composed of one or more flat concentric rings as a part of the chamber hardware between this chuck and plasma reaction chamber. SOLUTION: A plasma reaction zone 16 in a vacuum chamber 10 is defined by an Si-sealing block 18, dome sidewall 10, chamber wall liner 22 and an electrostatic chuck 14. Inside the wall liner 22, a plasma guard 26 having a flat concentric ring structure is positioned by lift pins 28. The chuck 14 is aligned by an electrostatic chuck collar. To give a gap between a wafer 34 and plasma guard 26, a height of color extrusion is provided. An etching gas is fed through a gas flow entrance 38 into the chamber, and a thermocouple 40 is mounted on the top face of the block 18 for controlling the temp.