PLASMA STATE DETECTING METHOD AND DEVICE, PLASMA CONTROLLING METHOD AND DEVICE, AND ETCHING END POINT DETECTING METHOD AND DEVICE,申请号JP19950053672-传众专利搜索

发明名称	PLASMA STATE DETECTING METHOD AND DEVICE, PLASMA CONTROLLING METHOD AND DEVICE, AND ETCHING END POINT DETECTING METHOD AND DEVICE
摘要
申请公布号	JPH08227875(A)	申请公布日期	1996.09.03
申请号	JP19950053672	申请日期	1995.02.17
申请人	SEIKO EPSON CORP	发明人	MIYASHITA TAKESHI;ODA YOSHIO;KURASHINA OSAMU
分类号	H05H1/46;C30B25/16;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H01L21/306	主分类号	H05H1/46
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