| 摘要 |
PURPOSE: To detect the image forming characteristics of a projection optical system such as magnification and image distortion accurately by measuring the changing state as to how the known length of the pattern movement on the side of a mask is changed through the projection optical system. CONSTITUTION: A specified pattern 202 formed on a mask R is moved to the first position P1. Then, the specified pattern 202 is moved to the second position P2, which is different from the first position P1, vertically with respect to the optical axis of a projection optical system PL. Thereafter, the relationship between the first position P1 and the second position P2 is detected. At the same time, the relationship between the projected position of the image of the specified pattern 202 at the first position P1 caused by the projection optical system PL and the projected position P3 of the image of the specified pattern 202 at the second position P2 caused by the projection optical system PL is detected. The image forming characteristics of the projection optical system are obtained based on the respective detected position relationships. |
