| 摘要 |
<p>PURPOSE: To provide a method for manufacturing a highly functional field emission type element with both of the curvature and apex angle of an emitter end formed to be small. CONSTITUTION: A recess 11 having a vertical side wall is formed on the surface of a substrate 10 and, then, tapered at a sputter etching process. In addition, a sacrificial film 12 is stacked on the substrate 10 in such a state as having an exposed sharp recess 14 on surface. Then, an emitter electrode film 13 is stacked on the sacrificial film 12, and a micro cathode having a sharp edge is thereby formed. Thereafter, the micro cathode is exposed via the elimination of an unnecessary material thereunder at an etching process.</p> |
