Projection exposure apparatus

摘要

A projection exposure apparatus comprising: an illumination, optical system for irradiating a mask with illumination light; a projection optical system for projecting an image of a pattern formed on the mask onto a substrate; an optical member for defining a light quantity distribution of the illumination light on a Fourier transform plane to the pattern on the mask in the illumination optical system or on a plane in the vicinity thereof such that the illumination light is intensified in a first region inside a substantial circle of radius r1 with the center on the optical axis of the illumination optical system and in a second region formed as a substantially annular zone bordered by a substantial circle of radius r2 and a substantial circle of radius r3 (where r1