发明名称 PROCESS MONITORING APPARATUS
摘要 <p>PURPOSE: To provide a process monitoring apparatus whose monitoring property and operability are excellent in the process monitoring and operating apparatus of a process monitoring and control system by which monitoring information on a process is displayed on a plurality of display screens. CONSTITUTION: A process monitoring apparatus is provided with a display- specification-input reception part 35 which provides the common display specification of monitoring information being displayed on a plurality of display screens, with a display-specification-change-instruction-input reception part 36 which instructs the collective change of the display specification on the display screens, with a display-screen-information storage region 39 which stores the information displayed on the respective display screens and with a process-monitoring- information-display processing part 33 which displays information on the respective display screens according to the information by the display-screen- information storage region 39. Consequently, since the monitoring information being displayed on the plurality of display screens can be processed collectively to the same display specification so as to be displayed, the monitoring property and the operability of the process monitoring apparatus can be enhanced.</p>
申请公布号 JPH08226829(A) 申请公布日期 1996.09.03
申请号 JP19950033331 申请日期 1995.02.22
申请人 HITACHI LTD 发明人 OGUMA TAKU;SHIMIZU KATSUTO;ITO AKIO
分类号 G01D7/00;G05B23/02;(IPC1-7):G01D7/00 主分类号 G01D7/00
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