发明名称 SUBSTRATE AND ITS MANUFACTURE
摘要 <p>PURPOSE: To increase the kind of a pattern for process monitoring without increasing a chip area by a method wherein circuit patterns are formed differently by using an identical master plate. CONSTITUTION: Patterns, for process monitoring, which are selected arbitrarily from two kinds of patterns 7A, 7B which have been prepared in advance are formed in scribing regions 3 formed around a plurality of circuit elements 2A to 2I which are formed on a silicon single-crystal substrate 1. Thereby, since circuit patterns can be formed differently by using an identical master plate, kinds of patterns for process monitoring can be increased without increasing a chip area. As a result, the number of process monitoring items can be increased.</p>
申请公布号 JPH08222509(A) 申请公布日期 1996.08.30
申请号 JP19950027797 申请日期 1995.02.16
申请人 HITACHI LTD;HITACHI MICROCOMPUT SYST LTD 发明人 HASHIMOTO KOICHIRO
分类号 H01L21/027;H01L21/301;(IPC1-7):H01L21/027 主分类号 H01L21/027
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