发明名称 METHOD FOR CRYSTAL GROWTH OF GALLIUM NITRIDE BASED COMPOUND SEMICONDUCTOR
摘要 PURPOSE: To improve the crystallizability of a gallium nitride based compound semiconductor and further to make the semiconductor stable and to make it grow with an excellent yield. CONSTITUTION: A method for crystal growth wherein a crystal of a gallium nitride based compound semiconductor of which the general formula is expressed by GaXAl1-XN (0<=X<=1) is laminated on a substrate being different therefrom in a thermal expansion coefficient and a lattice constant. The crystallizability of the semiconductor can be improved greatly by using a GaN buffer layer made a single crystal partially, by making the substrate amorphous by partial ion implantation and by preparing a lattice-shaped insulator pattern on the substrate.
申请公布号 JPH08222812(A) 申请公布日期 1996.08.30
申请号 JP19950029434 申请日期 1995.02.17
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OTA HIROYUKI;TAKAMORI AKIRA;ONAKA SEIJI
分类号 H01L21/205;H01L33/12;H01L33/32;H01S5/00;H01S5/02;H01S5/323 主分类号 H01L21/205
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