发明名称 |
METHOD FOR CRYSTAL GROWTH OF GALLIUM NITRIDE BASED COMPOUND SEMICONDUCTOR |
摘要 |
PURPOSE: To improve the crystallizability of a gallium nitride based compound semiconductor and further to make the semiconductor stable and to make it grow with an excellent yield. CONSTITUTION: A method for crystal growth wherein a crystal of a gallium nitride based compound semiconductor of which the general formula is expressed by GaXAl1-XN (0<=X<=1) is laminated on a substrate being different therefrom in a thermal expansion coefficient and a lattice constant. The crystallizability of the semiconductor can be improved greatly by using a GaN buffer layer made a single crystal partially, by making the substrate amorphous by partial ion implantation and by preparing a lattice-shaped insulator pattern on the substrate. |
申请公布号 |
JPH08222812(A) |
申请公布日期 |
1996.08.30 |
申请号 |
JP19950029434 |
申请日期 |
1995.02.17 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
OTA HIROYUKI;TAKAMORI AKIRA;ONAKA SEIJI |
分类号 |
H01L21/205;H01L33/12;H01L33/32;H01S5/00;H01S5/02;H01S5/323 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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