发明名称 WORKING METHOD FOR MASS FLOW SENSOR
摘要 <p>PURPOSE: To improve the adhesive force between a substrate and a conductive film so as to facilitate working for a mass flow sensor by forming a binder layer of a thin film layer of chromium and titanium between a substrate formed by a brittle material and a conductive film, and using a vapor phase or liquid phase film formation method for a multilayer film of a thin film thermally- sensitive element. CONSTITUTION: Thin film thermally-sensitive elements 11-22 are formed as a mutilayer film comprising a nickel or platinum thin film layer for forming a main conductive film 1A, and a chrome or titanium thin film layer for forming a binder layer 1B between a substrate 3 formed by a brittle material and the conductive film 1A. The above multilayer film forming method uses a vapor phase film formation method adopting evaporation technique or spatter technique, or a liquid-phase film formation method adopting plating technique. Accordingly, the adhesive force between the substrate 3 and the conductive film 1A can be improved, working for a mass flow sensor is a process suitable for mass production, and working can be facilitated.</p>
申请公布号 JPH08219837(A) 申请公布日期 1996.08.30
申请号 JP19950026423 申请日期 1995.02.15
申请人 FUJI ELECTRIC CO LTD 发明人 SOMA SHINICHI;OISHI MITSURU;SAKAGAMI SATOSHI;UNO MASAHIRO;WATABE RIKIMA
分类号 G01P5/12;C23F1/00;C23F4/00;G01F1/68;G01F1/692;(IPC1-7):G01F1/68 主分类号 G01P5/12
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