| 摘要 |
PURPOSE: To obtain a foreign-matter inspecting apparatus, which can detect the foreign matter such as dust attached on a reticle and a pellicle surface in high accuracy, and a manufacturing method of semiconductor device using the apparatus. CONSTITUTION: The luminous flux from a light source means is guided on a surface under inspection 1a. The scattered light generated from a foreign matter 10 on the surface under inspection 1a is detected by a detecting means 7. The signal from the detecting means 7 is processed in a signal processing means 8. The state of presence or abasence of the foreign matter 10 is detected for every two-dimensional position coordinates on the surface under inspection 1a. At this time, the signal processing means 8 obtains the largest-position coordinates, which give the maximum value among the signals of the respective position coordinates obtained by the detecting means 7 based on the scattered light from the foreign matter 10 on the surface under inspection 1a, and stores the coordinates in a memory means. The signal corresponding to the coordinates of the surrounding positions neighboring the largest-position coordinates are adjusted and outputted. |
