发明名称 MULTILAYER INTERCONNECTION SUBSTRATE
摘要 PURPOSE:To improve interlayer adherence and halo resistance by bringing a copper oxide layer formed by oxidizing a copper circuit of an inner layer circuit into contact with metal having lower oxidizing/reducing potential than CuO in electrolyte, and then integrally forming a laminate in which outer layer materials are disposed via prepregs. CONSTITUTION:The surface of a copper circuit 1 of an inner layer material 2 having the copper circuit 1 one or both side faces is oxidized, and a copper oxide layer 3 of CuO, Cu2O is formed. Then, the layer 3 is brought into contact with metal having lower oxidizing/reducing potential than that of CuO in electrolyte to roughen the surface of the circuit 1. A predetermined number of prepregs 3 and outer layer materials 5 are arranged on the obtained surface, and laminated integrally. Thus, the interlayer adhesive strength of the material 2 and the prepreg 4 layer is improved to realize excellent halo resistance.
申请公布号 JPH02306697(A) 申请公布日期 1990.12.20
申请号 JP19890128337 申请日期 1989.05.22
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 TANNO TOMIO;YAMANE TOMOAKI;ICHIKI TSUTOMU;AKAMATSU TOSHIYUKI
分类号 H05K3/38;H05K3/46 主分类号 H05K3/38
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