| 摘要 |
Photosensitive compositions, suitable for use as negative photoresist compositions with exposing systems that operate using near UV radiation, are provided. The photosensitive compositions comprise (i) photoactive material which is (a) photoacid generator and, as sensitizer, phenothiazine, a phenothiazine derivative, phenoxazine or a phenoxazine derivative or (b) 2-chlorophenothiazine, and (ii) acid-hardening resin system. The photosensitive compositions can be used to produce thermally stable, high resolution images with near UV exposing radiation. |
