首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
WAFER HEATING APPARATUS
摘要
申请公布号
KR960007294(Y1)
申请公布日期
1996.08.28
申请号
KR19900020495U
申请日期
1990.12.21
申请人
LG SEMICONDUCTOR CO., LTD.
发明人
BYUN, SUK - HO
分类号
H01L21/304;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Circuit arrangement for the transmission of signals
Keyed frequency modulation carrier wave systems
Screen rooms
Benzimidazole derivatives
Lift arm assembly
Process of preparing evaporated milk
Liquid pepper solution and process of producing the same
Purification of anthraquinone solutions
Production of asparagine
Heat treatment for titanium base alloy, circa 4% mn, and 4% al
Method and composition for increasing animal growth rate
Arrowhead construction
Shock isolator
Detachable blade bit
Combination concrete mixer and portable dispenser
Function generator of two independent variables
Mail box flag
Apparatus for coating the face plate of a cathode-ray tube envelope
Tensioning device for overseam sewing machines
Power piston with control valve