Method for forming rough surface with controlled convex shape

摘要

First two or more layers are formed on the substrate, the layers having different etching rates such that the etching rates ascend from a bottom layer to a top layer. Second, a mask pattern is formed on the surface of the layers, the mask pattern comprising a plurality of islands each having a predetermined shape. Finally, isotropic etching is performed on the surface of the layers until a desired convex shape is formed on the surface of the layers. The desired convex shape on the surface of the layers is determined by the etching rate ratios of the layers. The etching rate of each layer is controlled by layer formation conditions such as a curing temperature for organic materials, and a flow rate ratio of source gases for inorganic materials.