发明名称 Measuring system for position measurement in nanometer and subnanometer range
摘要 One of the two component parts can also work as a part of a X-ray radiation detection system. This part is so tuned to the characteristic parameters of the stationary X-ray wave field. That interactions with the energy density distribution of this stationary X-ray wave field can be determined in the space, or its influencing by the other part relative to its position as a detection signal. Data from this can be derived regarding the position of these component parts one to the other, based on their positions relative to the stationary X-ray wave field. The two parts are parts of a deformable crystal or layer system, with flat boundary surfaces, movable to contact each other or against each other. The resulting stationary X-ray field inside the system of the two component parts is essential for the interaction and position measurement.
申请公布号 DE19612361(A1) 申请公布日期 1996.08.22
申请号 DE19961012361 申请日期 1996.03.28
申请人 MEYER, DIRK, 01326 DRESDEN, DE 发明人 MEYER, DIRK, 01326 DRESDEN, DE
分类号 G01B15/00;G01D5/48;(IPC1-7):G01B15/00;G01N23/207 主分类号 G01B15/00
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