发明名称 Formation of high quality patterns for substrates and apparatus therefor
摘要 <p>An apparatus and method for accurately and rapidly machining a workpiece, particularly for drilling holes smaller than can be formed by other methods, by using a high power pulsed Nd:YAG laser. A low power HeNe laser is joined to the optical path of the high power laser. The colinear beams then scan along one axis of the workpiece. The low power beam is partially split off to a location determining device before final deflection to the workpiece. Deflection in a second axis is achieved by linearly moving the workpiece so that the beam will impinge upon the desired location of the workpiece.</p>
申请公布号 EP0426600(B1) 申请公布日期 1996.08.21
申请号 EP19900480160 申请日期 1990.10.09
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LAPLANTE, MARK JOSEPH;LAVINE, MARK GERALD;LONG, DAVID CLIFFORD;LU, POYANG;SEKSINSKY, JOHN JOSEPH;THORP, LAWRENCE DANIEL;WEISS, GERHARD
分类号 B23K26/00;B23K26/02;B23K26/04;B23K26/08;B23K26/38;H01L21/00;H05K3/00;(IPC1-7):B23K26/04 主分类号 B23K26/00
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