发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE: To obtain a resist compsn. excellent in performance such as gamma value. CONSTITUTION: This resist compsn. contains alkali-soluble polyphenol represented by formula I, an alkali-soluble polyhydroxy compd. represented by formula II, alkali-soluble novolak resin and a 1,2-quinonediazido compd. In the formula I, each of R and1 -R6 is H, 1-6C alkyl, etc., R7 is 1-6C alkyl, etc., and each of (m) and (n) is an integer of 1-3. In the formula II, R8 is H, etc., each of R9 -R11 is 1-6C alkyl, etc., each of (a)-(f) is an integer of 0-3 and at least two among (b), (d) and (f) are integers of 1-3.
申请公布号 JPH08211600(A) 申请公布日期 1996.08.20
申请号 JP19950019056 申请日期 1995.02.07
申请人 SUMITOMO CHEM CO LTD 发明人 NAGASE KYOKO;NAKANISHI HIROTOSHI;SUZUKI NAOKO;ANDO NOBUO
分类号 G03F7/022;G03F7/004;G03F7/023;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/022
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