发明名称 RESIST COATING DEVICE
摘要 <p>PURPOSE: To control the liquid surface of a resist to specified height and to provide high film quality without an irregular coating state because of changes in the resist liquid surface. CONSTITUTION: This device is equipped with a resist liquid surface sensor 10 which detects the height of the resist soln. 4 reserved in a tray 5 for the resist soln. 4, a correcting rod 11 inserted into the resist soln. in the tray 5, a rod driving device 20 to change the inserting length of the correcting rod 11, and an operating device 17 which sends driving signals to the rod driving device 20 according to the detection signals from the resist liquid surface sensor 10 to control the liquid surface of the resist soln. 4 to specified height.</p>
申请公布号 JPH08211625(A) 申请公布日期 1996.08.20
申请号 JP19950020535 申请日期 1995.02.08
申请人 HITACHI LTD 发明人 NAMIKI JUNICHI;SHIBA MITSUAKI
分类号 G03F7/16;B05C1/02;B05C11/10;G02B5/20;(IPC1-7):G03F7/16 主分类号 G03F7/16
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