MULTI-CHAMBER PROCESSING DEVICE

摘要

PURPOSE: To heighten throughput to the utmost, to prevent the deviation of process condition and wafer contamination by dust and to perform uniform and clean process. CONSTITUTION: It comprise a process chamber 3 that is equipped with a process device 1 that perform specific process and an elevating mechanism 2 for changing the position of the process device 1, a transfer chamber 5 that is equipped with a wafer transfer mechanism 4 that transfers wafers to other process chamber 3 and a buffer chamber 8 that is connected with the process chamber 3 and the transfer chamber 5 through gate valves 6a and 6b and equipped with a wafer transfer mechanism 7.