发明名称 ROTARY TYPE SUBSTRATE TREATING DEVICE
摘要 <p>PURPOSE: To make it possible to simplify constitution without generating the traces of chucking on the rear surface of a substrate and to avert the generation of stains of the rear surface of the substrate occurring in the constitution to vertically move the substrate for the purpose of carrying in and out of the substrate. CONSTITUTION: The outer peripheral edge of the substrate W is held by a substrate supporting member 10 which supports the substrate W by coming into point contact with the outer peripheral edge side of the rear surface of the substrate W and a regulating member 9 which regulates the position in the horizontal direction of the substrate W by coming into point contact with the outer peripheral end edge of the substrate W supported at the substrate supporting member 10, by which the substrate is made rotatable around the axial center of a perpendicular direction. The treating device is thus so constituted that the substrate is made rotatable around the axial center in the perpendicular direction. The substrate supporting member 10 itself is vertically moved to a treating position and a transferring and receiving position, by which the substrate is transferred to and received from a substrate transporting device.</p>
申请公布号 JPH08206570(A) 申请公布日期 1996.08.13
申请号 JP19950039051 申请日期 1995.02.02
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 YABE MANABU
分类号 B05C11/08;H01L21/68;H01L21/683;(IPC1-7):B05C11/08 主分类号 B05C11/08
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