| 摘要 |
PURPOSE: To provide a positive resist composition superior, especially, in effective sensitivity and yet free from scum and superior in various performances, such as heat resistance and a pattern profile. CONSTITUTION: The positive resist composition comprises a novolak resin obtained by condensing an aldehyde mixture comprising an aldehyde compound represented by the formula: OHC-(CH2 )n -CO2 R (R is an H atom or a 1-6C alkyl group or the like and n is 0, 1, 2, or 3) and formaldehyde and phenols in the presence of an acid catalyst, and a 1,2-quinonediazido compound, and an alkali- soluble polyhydric phenol compound having a molecular weight of <900. |
