CRYSTAL DEFECT MEASURING METHOD OF SEMICONDUCTOR SUBSTRATE,申请号JP19950006848-传众专利搜索

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发明名称	CRYSTAL DEFECT MEASURING METHOD OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPH08203969(A)	申请公布日期	1996.08.09
申请号	JP19950006848	申请日期	1995.01.20
申请人	KAWASAKI STEEL CORP	发明人	IKESU HARUHIKO
分类号	H01L21/66;H01L43/06;(IPC1-7):H01L21/66	主分类号	H01L21/66
代理机构		代理人
主权项
地址

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