| 摘要 |
<p>PURPOSE: To enhance a flow of treatment liquid for use in a wet treatment such as etching, cleaning or the like of a semiconductor wafer to provide a high-quality treated wafer. CONSTITUTION: In this semiconductor carrier that is used when an etching treatment, a cleaning treatment or the like of a semiconductor wafer is performed, under a groove 6 that is provided in a wafer falling preventing rod 3, for preventing a wafer 4 from falling, a through hole 7 for effectively flowing treatment liquid is provided in a vertical direction to a longitudinal direction of the wafer falling preventing rod 3 and in the same direction as the groove 6. Thus, in a wet treatment such as etching, cleaning or the like of the semiconductor wafer, it is possible to provide the semiconductor wafer carrier capable of accurately and effectively flow the treatment liquid, and of providing the high-quality treated semiconductor wafer.</p> |
