| 摘要 |
PURPOSE: To eliminate the need for an alignment stage of the photomask images formed with color filter patterns and the apertures of black matrices by transferring and forming the apertures of the black matrix patterns formed on a photomask onto the light shielding films on a glass substrate by using a photolithography means every time the color filters of the same colors are formed. CONSTITUTION: This process has a stage for forming the light shielding films on the glass substrate and a stage for forming the black matrices having the apertures 23 by using the photolithography means in the color filter forming parts every time the color filters of the same colors are formed on the light shielding films. The process has also a stage for forming photosensitive coloring materials of a negative type dispersed with pigments on the glass substrate formed with the apertures 23 in the black matrices. Further, the process has a stage for forming the sensitized parts of the photosensitive coloring materials in the apertures 23 formed in the black matrices by irradiating the glass substrate formed with the light shielding films with light from its rear surface with the black matrices having the apertures as the photomask 21. |
