| 摘要 |
PURPOSE: To provide a polymer useful for the base polymer of the resist composition and the radiation sensitive negative resist composition containing it high in resolution and development characteristics and yet good in storage stability and to obtain the polymer extremely useful as an resist material for LSI. CONSTITUTION: The polymer comprises repeating units each represented by formula I and formula II and it has a weight average molecular weight of 3000-50000, and in formulae I and II, R is an H atom or a methyl group; R<1> is the 2,4-diamino-s-triazinyl group represented by formula III; at least one of R<2> -R<5> is an alkoxymethyl group -CH2 OR<6> , and the others are H atoms; and R<6> is a 1-4 C alkyl group. |
