发明名称 MANUFACTURE OF FIELD EFFECT TRANSISTOR
摘要 <p>PURPOSE: To reduce the formation of the electrodes of a field effect transistor having a comb-type electrode structure from the formation of the electrodes in three layers to the formation of the electrodes in two layers to simplify the processes for manufacturing the transistor. CONSTITUTION: When first layer source electrodes 7 and first layer drain electrodes 8 are formed, a gate busbar 9 is formed in the same process as that for forming the electrodes 7 and 8 and when second layer gate electrodes 13 are formed, the electrodes 13 are connected with the gate busbar 9 and mat the same time, a source electrode wiring 14 and a drain electrode wiring 16, which are respectively connected with the electrodes 7 and the electrodes 8, are formed.</p>
申请公布号 JPH08203928(A) 申请公布日期 1996.08.09
申请号 JP19950013137 申请日期 1995.01.30
申请人 NEC KANSAI LTD;NEC CORP 发明人 KANAMORI MIKIO;IMAMURA TAKAFUMI
分类号 H01L29/41;H01L21/285;H01L21/338;H01L23/482;H01L29/417;H01L29/423;H01L29/812;(IPC1-7):H01L21/338 主分类号 H01L29/41
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