| 摘要 |
PURPOSE: To provide a resist material prevented from the deterioration of resist pattern formation and resolution in the case of using a chemically amplifiable resist for forming a micro-pattern by adding a straight-chain compound having a perpendicular orientation. CONSTITUTION: The resist material contains a resin and a photosensitive acid generating agent and changes its solubility by using the catalytic action of the acid generated from the acid generating agent. The straight-chain compound having the perpendicular orientation to be added is insolubilized in an alkaline developing solution by adding a hydroxyl group to an organic molecule or a part of it and protecting it by a t-butoxycarbonyl group or the like. This straight-chain compound is selected from a group of a cyclohexanecarboxylic acid cyclohexyl ester, a cyclohexanecarboxylic acid aryl ester, and a benzoic acid arylester, and the like. |
