PRODUCTION OF BASE FOR SILVER HALIDE PHOTOGRAPHIC SENSITIVE MATERIAL HAVING ANTISTATIC LAYER

摘要

PURPOSE: To provide a process for producing a base for silver halide photographic sensitive materials which stabilizes an antistatic layer contg. aπelectron based conductive polymer without degrading the antistatic performance deteriorated in the process of storage after the formation of this layer. CONSTITUTION: This process for producing the base for silver halide photographic sensitive materials prevents the product of the luminance of the light to be cast to the base having the antistatic layer and the time for exposure to light from exceeding 15,000 lux.hour after the formation of the antistatic layer contg. theπelectron based conductive polymer having an absorption maximal wavelength within a range from 300 to 700nm and before application of silver halide emulsion layers. The antistatic layer of theπelectron based conductive polymer having instability to light is produced in the state of sufficiently suppressing the light, by which the degradation in the antistatic performance and photographic performance occurring in such instability is ameliorated.