发明名称 |
METHOD FOR FILLING HOLE BY HIGH PRESSURE REFLOW |
摘要 |
PURPOSE: To fill a contact hole with a part of metal film by high pressure reflow by making the contact hole such that the contact resistance is not increased. CONSTITUTION: A plurality of contact holes 14 are made through an insulation film 13 for one electrical connection. Minimum diameter of each contact hole 14 (14a-14d) is set smaller than the thickness of a metal film 16 deposited on the insulation film 13. The metal film 16 is then deposited on the insulation film 13 while leaving a space in each contact hole 14a-14d and then pressure is applied to the surface of the metal film 16 so that a part of the metal film 16 is pushed into each contact hole 14a-14d thus filling each contact hole 14a-14d with a part of the metal film 16. Minimum diameter of the plurality of contact holes 14a-14d is preferably set at 0.6μm or less.
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申请公布号 |
JPH08203895(A) |
申请公布日期 |
1996.08.09 |
申请号 |
JP19950006878 |
申请日期 |
1995.01.20 |
申请人 |
SONY CORP |
发明人 |
FUJII MIKA;KOYAMA KAZUHIDE |
分类号 |
H01L21/28;H01L21/3205;H01L21/768;(IPC1-7):H01L21/320 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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