发明名称 Halbleitervorrichtung mit Mehrlagenverdrahtung und Verfahren zu ihrer Herstellung
摘要 A semiconductor device having multilayer wiring for providing power and control signals to elements of the device comprising, a first wiring element (14, 15) for supplying power to a plurality of elements of the semiconductor device, a second wiring element (11, 12, 13) made of a first material for carrying direct current or pulsed direct current to at least one element of said semiconductor device, and a third wiring element (16) made of a second material for carrying bidirectional signals to at least one element of said semiconductor device, wherein the resistance to electromigration of the first material is higher than the resistance to electromigration of the second material.
申请公布号 DE69027614(D1) 申请公布日期 1996.08.08
申请号 DE1990627614 申请日期 1990.03.14
申请人 KABUSHIKI KAISHA TOSHIBA, KAWASAKI, KANAGAWA, JP 发明人 NOGUCHI, TATSUO, C/O INTELLECTUAL PROPERTY DIV., TOKYO, JP;YOSHIDA, MASAYUKI, C/O INTELLECTUAL PROPERTYDIV., TOKYO, JP;HATANAKA, KAZUHISA, C/O INTELLECTUAL PROPERTYDIV., TOKYO, JP;TANAKA, SHIGERU, C/O INTELLECTUAL PROPERTY DIV., TOKYO, JP
分类号 H01L23/522;H01L23/528;H01L23/532;H01L27/092;H01L29/45;(IPC1-7):H01L23/532;H01L21/768 主分类号 H01L23/522
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