发明名称 Automatische Vorrichtung zum Läppen von Wafern.
摘要 An automatic wafer lapping apparatus in which a pair of turntable stages are provided which each have a vertical central shaft and a pin on which the wafer carriers are spitted and piled up; furthermore, the teeth of the sun gear and the internal gear of the lapping assembly are bevelled at their upper portions in a manner such that the upper end of each tooth is tapered and converge into a linear ridge so as to facilitate automatic and prompt meshing of the carriers inbetween them. <IMAGE>
申请公布号 DE69106311(T2) 申请公布日期 1996.08.08
申请号 DE1991606311T 申请日期 1991.10.21
申请人 SHIN-ETSU HANDOTAI CO., LTD., TOKIO/TOKYO, JP 发明人 HASEGAWA, FUMIHIKO, URAWA-SHI, SAITAMA-KEN, JP;HASHIMOTO, HIROMASA, NISHI-SHIRAKAWA-GUN, FUKUSHIMA-KEN, JP
分类号 B24B37/04;B24B37/34;H01L21/00;(IPC1-7):H01L21/00 主分类号 B24B37/04
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