METHOD AND APPARATUS FOR INCREASING PRODUCTION EFFICIENCY AND THIN FILM GRADE OF VERTICAL TYPE LOW PRESSURE CHEMICAL VAPOR DEPOSITION DEVICE

摘要

PURPOSE: A method and apparatus for increasing production efficiency and a thin film grade of a vertical type low pressure chemical vapor deposition device capable of removing a time required to control an electric heater and improving a thin film grade are provided. CONSTITUTION: The method for increasing production efficiency and a thin film grade of a vertical type low pressure chemical vapor deposition device, the method comprising the steps of: moving a reactor to a direction of a outer lower portion of an electric heater of the vertical type low pressure chemical vapor deposition device while maintaining a temperature of the electric heater as it is; naturally cooling a wafer at a nitrogen atmosphere in the reactor; and cleaning the reactor.