PLASMA ETCHING APPARATUS AND PLASMA ETCHING,申请号JP19950008610-传众专利搜索

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发明名称	PLASMA ETCHING APPARATUS AND PLASMA ETCHING
摘要
申请公布号	JPH08199377(A)	申请公布日期	1996.08.06
申请号	JP19950008610	申请日期	1995.01.24
申请人	SONY CORP	发明人	FUKUDA SEIICHI
分类号	C30B25/14;C23F4/00;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):C23F4/00;H01L21/306	主分类号	C30B25/14
代理机构		代理人
主权项
地址

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