发明名称 Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus
摘要 V-shaped linear groove portions are formed at regular intervals and at three positions (with 120 DEG pitches) on a periphery, concentric with a ring-shaped support frame, of an X-ray mask to extend in the radial direction. On the other hand, corresponding mounts, as projecting portions, each having a spherical leading end are disposed at three positions on a mask chuck. The mask is held on the mask chuck at the three positions by engaging the corresponding V-shaped linear groove portions and the projecting portions.
申请公布号 US5544213(A) 申请公布日期 1996.08.06
申请号 US19940343961 申请日期 1994.11.17
申请人 CANON KABUSHIKI KAISHA 发明人 CHIBA, YUJI;HARA, SHINICHI
分类号 G03F1/14;G03F1/66;G03F7/20;G21K1/06;H01L21/027;(IPC1-7):G21K5/00 主分类号 G03F1/14
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