发明名称 |
Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus |
摘要 |
V-shaped linear groove portions are formed at regular intervals and at three positions (with 120 DEG pitches) on a periphery, concentric with a ring-shaped support frame, of an X-ray mask to extend in the radial direction. On the other hand, corresponding mounts, as projecting portions, each having a spherical leading end are disposed at three positions on a mask chuck. The mask is held on the mask chuck at the three positions by engaging the corresponding V-shaped linear groove portions and the projecting portions. |
申请公布号 |
US5544213(A) |
申请公布日期 |
1996.08.06 |
申请号 |
US19940343961 |
申请日期 |
1994.11.17 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
CHIBA, YUJI;HARA, SHINICHI |
分类号 |
G03F1/14;G03F1/66;G03F7/20;G21K1/06;H01L21/027;(IPC1-7):G21K5/00 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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