| 摘要 |
PURPOSE: To form a thin film, particularly an optical thin film simultaneously on both surfaces of a substrate with excellent reproducibility at a high speed using one target (vaporizing source) without necessitating a complicated structure by sputtering method. CONSTITUTION: In forming the thin film by sputtering method, the thin film is formed simultaneously on both surface of the substrate 1 by using only one granular MgF2 as the target 2 and arranging the substrate 1 to be film-formed above the center of the target 2 and at the position vertical to the surface of the target 2. As a result, the simultaneous film formation on both surface is stably executed at a high speed. |
