PHOTORESIST COATING APPARATUS

摘要

PURPOSE: To provide a photoresist coating apparatus almost perfectly eliminating the adhesion of a photoresist to a glass substrate on the rear side of the photoresist coating surface thereof. CONSTITUTION: A photoresist coating apparatus consists of a substrate feed part 2 feeding a glass substrate 9 successively and a photoresist coating part 1 consisting of a press roller 4 and a photoresist coating roller 3. When the glass substrate 9 is fed and passed through the nip between the press roller 4 and the photoresist coating roller 3, a photoresist is applied to one surface of the glass substrate 9 by rolling up the photoresist by the photoresist coating roller 3. Herein, a streak of a groove 10 is formed to the surface of the press roller 4 over the width direction thereof and the feed timing of the glass substrate 9 is determined so that the rear end part of the glass substrate 9 and the arrival time of a streak of the groove 10 almost coincide with each other when the glass substrate 9 is fed and passed through the nip between the press roller 4 and the photoresist coating roller 3.