| 摘要 |
PURPOSE: To provide an electrode plate for plasma etching consisting of vitreous carbon, with the consumption reduced, generating no particles and capable of being operated at a uniform etching rate. CONSTITUTION: Electrolysis is conducted in 1N HNO3 for 24hr at a constant current of 5mA/cm<2> with a vitreous carbon constituting an electrode plate for plasma etching as an anode. Consequently, an electrode plate for plasma etching consisting of the vitreous carbon, having 2μm centerline average roughness Ra and <=15μm maximum roughness Rmax after elecrtolysis is obtained, and stabilized etching is realized.
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