发明名称 APPARATUS FOR UNIFORMLY ABLATING A SURFACE
摘要 <p>The apparatus and the method of ablating matter from a substrate comprise a laser (10), an optical system (12, 14, 18) and a means (20) which is arranged within the beam path of the laser and by means of which a laser spot is formed which exhibits light and dark sections. By adjusting the means (20) prior to each laser pulse, the entire surface area of the laser spot is subjected to the same number of laser pulses.</p>
申请公布号 WO1996022751(A1) 申请公布日期 1996.08.01
申请号 EP1996000288 申请日期 1996.01.24
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