发明名称 PHOTO SETTING RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photo setting resin composition capable of forming a hardening layer with high performance and superior properties such as heat resistivity, moisture resistivity, adhesive property, mechanical property and electrical property, and being suitable for manufacturing a printed circuit board, a high density multi-layer board and a semiconductor package, and provide a photosensitive element capable of forming a hardening layer with superior properties such as heat resitivity, moisture resistivity, adhesive property, mechanical property and electrical insulation property by stacking the layer of the photo setting resin composition onto a support. SOLUTION: The photo setting resin composition includes an epoxy resin (A) containing acid-denatured vinyl group, an elastomer (B), photopolymerization initiator (C), a diluent (D) and a hardener (E) as essential components. The hardened surface layer of the photo setting resin composition has elastic modules of 1-100 MPa in the temperature range of 200-220 deg.C using a dynamic viscoelasticity measuring method. The photo setting resin composition is employed for a permanent mask, and the photosensitive element is formed by stacking the photo setting resin composition onto the support.
申请公布号 JP2002162738(A) 申请公布日期 2002.06.07
申请号 JP20010281900 申请日期 2001.09.17
申请人 HITACHI CHEM CO LTD 发明人 SATO KUNIAKI;HIRAKURA HIROAKI;ITO TOSHIHIKO;HIRAYAMA TAKAO;YOSHINO TOSHIZUMI
分类号 G03F7/027;C08G59/16;C08G59/20;G03F7/032;H05K3/28 主分类号 G03F7/027
代理机构 代理人
主权项
地址
您可能感兴趣的专利