发明名称 SOFT LASER MARKING METHOD AND APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a soft laser marking method and an apparatus thereof, which can mark without scattering molten silicon to deposit in a soft laser marking, even if the dot depth is great, and readily erase print, when a defective water is converted into a monitor product, etc. SOLUTION: The method of printing on a water surface by soft marking comprises irradiating the wafer with a laser beam from its downside, to conduct marking on the wafer surface.</p>
申请公布号 JP2002164264(A) 申请公布日期 2002.06.07
申请号 JP20000358918 申请日期 2000.11.27
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 SATO MICHITO
分类号 B41J2/44;B23K26/00;B23K101/40;B25H7/04;H01L21/02;(IPC1-7):H01L21/02 主分类号 B41J2/44
代理机构 代理人
主权项
地址