Magnetron sputtering apparatus

摘要

An appts. is claimed for depositing a film on a substrate in a gaseous atmos. in a vacuum chamber. Material is sputtered from a cylindrical shaped target rotatably carried by support blocks, the target contg. non-rotatable magnets. An electrical power supply is in communication with the target. At least one cylindrically shaped shield structure is carried by at least one support block and extends over at least one end of the target with a space therebetween. The shield structure comprises at least one annular structure extending around its outer surface. The annular structure(s) is dimensioned to interrupt any arc movements which may move across outer surface. Also claimed is a method of depositing a dielectric or insulating film onto a substrate in a gaseous atmos. in a vacuum chamber.