发明名称 X-RAY MICROSCOPE AND X-RAY GENERATING APPARATUS
摘要 PURPOSE: To provide an x-ray generating apparatus which can prevent scattered particulates from being emitted by keeping a distance in one side of a target material and forming an x-ray transmissive film with just enough thickneess to prevent damage by effects following an x-ray generating process. CONSTITUTION: Plasma generated by laser beam irradiation is closed in a space 14 surrounded with an x-ray generating target 11 and an x-ray transmissive film 12 and efficient x-ray generation is performed. In this case, a hole as small as 0.1μm diameter is opened in the x-ray generating target 11 by laser beam 30. The generated x-ray is emitted to a specimen side after being transmitted through the x-ray transmissive film 12 and at the same time radiates the laser source side through the hole. On the other hand, the particulates generated from plasma come into collision against the x-ray transmissive film 12 and the kinetic energy of the particles are absorbed and the particulates are retarded, do not pass the x-ray transmissive film 12, and are captured by the x-ray transmissive film 12. Consequently, scattered particulates adhere to the x-ray transmissive film 12 and emission of the scattered particulates are inhibited.
申请公布号 JPH08194100(A) 申请公布日期 1996.07.30
申请号 JP19950005477 申请日期 1995.01.18
申请人 SHIMADZU CORP;RIKAGAKU KENKYUSHO 发明人 HIROSE HIDEO;HARA TAMIO;ANDO KOZO;AOYANAGI KATSUNOBU
分类号 G21K5/02;G21K7/00;H05G1/26;(IPC1-7):G21K7/00 主分类号 G21K5/02
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