| 摘要 |
<p>PURPOSE: To provide a substrate holding implement by which a disk-shaped substrate, e.g. a wafer, can be held in a stable attitude by suppressing the right and left shake and the inclination (the fall) of the wafer and to provide a cleaning apparatus which prevents wafers from being stuck to each other due to the surface tension of liquid. CONSTITUTION: A first holding groove 4 to a third holding groove 6 are formed respectively in holding rods 31 to 33 so that a wafer W is held at three points. The first holding groove 4 is arranged so as to hold a part near the upper right from the lower end of the wafer W, and the second holding groove 5 is arranged so as to hold a part near the lower right at the left end of the wafer W so that they prevent the right and left shake of the wafer W. In addition, the third holding groove 6 is situated at the upper part at the right end of the wafer W so as to gain a support length. Thereby, the inclination of the wafer W is prevented.</p> |
