发明名称 Line exposure type image forming apparatus
摘要 A line exposure type image forming apparatus having a micromirror device 40 with numerous micromirrors 41 tiltable for reflecting light incident from a light source to a predetermined exposure position on a photosensitive material 2, and a sub-scan moving mechanism 8a for moving the photosensitive material relative to the exposure position. The micromirror device is disposed such that an imaginary line linking imaging positions on the photosensitive material of the micromirrors in a predetermined line is at an angle to a direction of relative movement of the photosensitive material. As a result, an exposure dot line is produced on the photosensitive material in a main scanning direction perpendicular to the direction of relative movement by a main scanning mirror set formed of micromirrors selected in a direction at an angle to a direction of the columns of the micromirror device.
申请公布号 US6486938(B1) 申请公布日期 2002.11.26
申请号 US20000704277 申请日期 2000.11.01
申请人 NORITSU KOKI CO., LTD. 发明人 MORITA AKIO;ISHII TOMOYUKI
分类号 H04N1/113;B41J2/44;B41J2/47;G02B26/08;G03B27/32;H04N1/195;(IPC1-7):G02B26/08;G03B27/52 主分类号 H04N1/113
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