| 摘要 |
PURPOSE: To arbitrarily overlap and display front, back and through patterns, to mutually collate them and to highly precisely measure dimensions on the micro pattern of a lead frame. CONSTITUTION: A plural pattern simultaneous measuring device inputs the image of the lead frame which is etching-worked, coverts the image data into CAD data and overlaps and displayed more than two CAD data. The image of the front pattern and the back pattern of the lead frame are set to be reflected images under a vertical light source and the image of the through pattern is set to be a transmission image under a downward illumination light source. The images are inputted, are raster/vector-converted and respective pieces of input image data are converted into CAD data. CAD data of the back pattern whose image pick up direction is inverse is inverted. Then, they are positioned and overlapped and they are displayed on a screen like (B), (C), and (D). |
