| 摘要 |
PURPOSE: To produce a low thermal expansion alloy capable of synthetically satisfying various characteristics required of a shadow mask. CONSTITUTION: This low thermal expansion alloy has a composition consisting of 35.0-37.0% Ni, 0.01-0.20% Si, 0.20-0.50% Mn, 0.0005-0.0040% B, 0.002-0.020% P, <=0.003% S, <=0.007% C, <=0.005% N, <=0.015% O, =0.003% Al, and the balance essentially Fe. If necessary, 0.10-0.90% Cr and further 0.01-1.0% Co can be incorporated. In the case where Cr is contained, the value of X defined by X=Cr%+1.67×Si%+0.97×Mn% is maintained at <=1.40. By this method, a shadow mask, excellent in resonance resistance, blackened film characteristic, and gas release resistance and free from doming phenomenon, can be obtained.
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