| 摘要 |
PURPOSE: To increase uniformity in lighting intensity on an exposed surface by combining plural lamp beams on the same optical path. CONSTITUTION: A lamp beam Qa emitted from an Hg-Xe arc lamp 11 and a laser beam Qe outputted from a pulse laser oscillator 12 are combined on the same optical path by means of a beam multiplexer optical system 21 and outputted as an exposed light beam Qp. This exposed light beam Qp is passed through a mask 2, forming the image on a wafer 6 by means of a projection optical system, and transferring a mask pattern formed on the mask 2 to the wafer 6. |
