| 摘要 |
A projection exposure method includes the steps of (a) irradiating a light from a light source (9) on an optical mask (4, 104), where the optical mask includes a main space (6, 106) which transmits light and has a desired exposure pattern, and a sub space (7, 110, 111) which transmits light and is provided adjacent to the main space, and (b) exposing a photoresist layer (2) by the light which is transmitted through the optical mask (4, 104) via a lens (3) so as to project an optical image of the main space (6, 106), where the sub space (7, 110, 111) has a narrow width such that the light transmitted through the sub space by itself does not expose the photosensitive layer (2). <IMAGE> |
