发明名称 METHOD AND STRUCTURE FOR PROVIDING ESD PROTECTION FOR SILICON ON INSULATOR INTEGRATED CIRCUITS
摘要 A method and structure for providing ESD protection for Silicon-On-Insulator (SOI) integrated circuits. The ESD protection circuit includes an electrically conductive pad and first conductor segment fabricated over an insulating layer. The first conductor segment connects the pad directly to a first node, without an intervening input resistor. A first diode is fabricated over the insulating layer and connected between the first node and a first voltage supply rail. Similarly, a second diode is fabricated over the insulating layer and connected between the first node and a second voltage supply rail. Ballast resistors can be included in series with each of the diodes. A cross power supply clamp, also fabricated over the insulating layer, is connected between the first and second voltage supply rails. The first node of the ESD protection circuit is coupled to the SOI integrated circuit to be protected. The ESD protection circuit can be fabricated on a minimum number of silicon islands to improve local thermal spreading. Improved ESD protection is provided to input, output, and I/O pins of an SOI integrated circuit, while promoting high speed signal transfer between these pins and the integrated circuit.
申请公布号 WO9622613(A1) 申请公布日期 1996.07.25
申请号 WO1996US00139 申请日期 1996.01.04
申请人 PEREGRINE SEMICONDUCTOR CORPORATION 发明人 STAAB, DAVID, R.;LI, SHEAU-SUEY
分类号 H01L27/04;H01L21/822;H01L27/02 主分类号 H01L27/04
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