发明名称 Liquid precursor for cubic-phase passivating/buffer film
摘要 A chemical composition consists essentially ((t-amyl)GaS)4. The chemical composition can be employed as a liquid precursor for metal organic chemical vapor deposition to thereby form a cubic-phase passivating/buffer film, such as gallium sulphide.
申请公布号 AU4695396(A) 申请公布日期 1996.07.24
申请号 AU19960046953 申请日期 1996.01.05
申请人 PRESIDENT AND FELLOWS OF HARVARD COLLEGE;GALIA, INC 发明人 ANDREW R BARRON;MICHAEL B POWER;ANDREW N MACINNES
分类号 C07F5/00;C07F5/06;C23C16/30;H01L21/314 主分类号 C07F5/00
代理机构 代理人
主权项
地址